Masks and reticles designed for integrated circuits specified in 3A001; h. Multi-layer masks with a phase shift layer.

Masks and reticles designed for integrated circuits specified in 3A001;

Pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates

fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles

Focused ion beam milling machines to produce or repair masks and reticles for patterns on semiconductor devices

Focused ion beam milling machines for producing or repairing masks and reticles for patterns on semiconductor devices

Parts of focused ion beam milling machines to produce or repair masks and reticles for patterns on semiconductor devices

Electron beam microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles

Parts and accessories for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates

Photomicrographic microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles

Optical stereoscopic microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles

Parts and accessories of electron beam microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles

Parts and accessories of photomicrographic microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles

Parts and accessories of optical stereoscopic microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles

Optical instruments and appliances for inspecting semiconductor wafers or devices or for inspecting masks, photomasks or reticles used in manufacturing semiconductor devices

Parts and accessories of optical instruments and appliances for inspecting semiconductor wafers or devices or for inspecting masks, photomasks or reticles used in manufacturing semiconductor devices